Sulphuric acid ≥96%, CMOS for microelectronic, J.T.Baker®
Supplier: Avantor
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Danger
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9684-03EA
40702.14
INR
9684-03
9684-05
Sulphuric acid ≥96%, CMOS for microelectronic, J.T.Baker®
Sulphuric acid
Formula:
H₂SO₄ MW: 98,08 g/mol Boiling Pt: ∼335 °C (1013 hPa) Melting Pt: 3 °C Density: 1,84 g/cm³ (20 °C) Storage Temperature: Ambient |
MDL Number:
MFCD00064589 CAS Number: 7664-93-9 EINECS: 231-639-5 UN: 1830 ADR: 8,II Merck Index: 14,08974 |
Specification Test Results
For Microelectronic Use | 95.0 - 97.0 % |
Recommended Storage Conditions: 15° - 100°F |
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Assay (H₂SO₄) | 95.0 - 97.0 % |
Color (APHA) | ≤10 |
Residue after Ignition | ≤2 ppm |
Chloride (Cl) | ≤0.1 ppm |
Nitrate (NO₃) | ≤0.2 ppm |
Phosphate (PO₄) | ≤0.3 ppm |
Trace Impurities - Aluminum (Al) | ≤50.0 ppb |
Arsenic and Antimony (as As) | ≤5.0 ppb |
Trace Impurities - Barium (Ba) | ≤10.0 ppb |
Trace Impurities - Beryllium (Be) | ≤10.0 ppb |
Trace Impurities - Bismuth (Bi) | ≤20.0 ppb |
Trace Impurities - Boron (B) | ≤10.0 ppb |
Trace Impurities - Cadmium (Cd) | ≤10.0 ppb |
Trace Impurities - Calcium (Ca) | ≤50.0 ppb |
Trace Impurities - Chromium (Cr) | ≤50 ppb |
Trace Impurities - Cobalt (Co) | ≤10.0 ppb |
Trace Impurities - Copper (Cu) | ≤10.0 ppb |
Trace Impurities - Gallium (Ga) | ≤10.0 ppb |
Trace Impurities - Germanium (Ge) | ≤10.0 ppb |
Trace Impurities - Gold (Au) | ≤20 ppb |
Heavy Metals (as Pb) | ≤200.0 ppb |
Trace Impurities - Iron (Fe) | ≤100.0 ppb |
Trace Impurities - Lead (Pb) | ≤20.0 ppb |
Trace Impurities - Lithium (Li) | ≤10.0 ppb |
Trace Impurities - Magnesium (Mg) | ≤50.0 ppb |
Trace Impurities - Manganese (Mn) | ≤10.0 ppb |
Trace Impurities - Mercury (Hg) | ≤5.0 ppb |
Trace Impurities - Molybdenum (Mo) | ≤10.0 ppb |
Trace Impurities - Nickel (Ni) | ≤10.0 ppb |
Trace Impurities - Niobium (Nb) | ≤10.0 ppb |
Trace Impurities - Potassium (K) | ≤50 ppb |
Trace Impurities - Silicon (Si) | ≤50 ppb |
Trace Impurities - Silver (Ag) | ≤10.0 ppb |
Trace Impurities - Sodium (Na) | ≤100.0 ppb |
Trace Impurities - Strontium (Sr) | ≤10.0 ppb |
Trace Impurities - Tantalum (Ta) | ≤10.0 ppb |
Trace Impurities - Thallium (Tl) | ≤20.0 ppb |
Trace Impurities - Tin (Sn) | ≤50 ppb |
Trace Impurities - Titanium (Ti) | ≤10.0 ppb |
Trace Impurities - Vanadium (V) | ≤10.0 ppb |
Trace Impurities - Zinc (Zn) | ≤50 ppb |
Trace Impurities - Zirconium (Zr) | ≤10.0 ppb |
Particle Count - 0.5 µm and greater | ≤60 par/ml |
Particle Count - 1.0 µm and greater | ≤10 par/ml |
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