Hydrogen peroxide 30% stabilised, CMOS for microelectronic use, J.T.Baker®
Supplier: Avantor
|
Danger
|
2201-54EA
0
INR
2201-54
2201-T2
2201-T4
2201-T8
2201-T9
Hydrogen peroxide 30% stabilised, CMOS for microelectronic use, J.T.Baker®
Hydrogen peroxide
Formula:
H₂O₂ MW: 34,01 g/mol |
MDL Number:
MFCD00011333 CAS Number: 7722-84-1 UN: 2014 ADR: 5.1,II |
Specification Test Results
For Microelectronic Use | |
Assay (H₂O₂) | 31.52 - 31.72 % |
Free Acid (µeq/g) | ≤0.2 |
Residue after Evaporation | ≤10 ppm |
Ammonium (NH₄) | ≤3 ppm |
Chloride (Cl) | ≤0.2 ppm |
Nitrate (NO₃) | ≤2 ppm |
Phosphate (PO₄) | ≤1 ppm |
Sulfate (SO₄) | ≤3 ppm |
Trace Impurities - Aluminum (Al) | ≤47.550 ppb |
Trace Impurities - Antimony (Sb) | ≤10.000 ppb |
Trace Impurities - Arsenic (As) | ≤10.000 ppb |
Arsenic and Antimony (as As) | ≤10.0 ppb |
Trace Impurities - Barium (Ba) | ≤6.870 ppb |
Trace Impurities - Beryllium (Be) | ≤10.000 ppb |
Trace Impurities - Bismuth (Bi) | ≤20.000 ppb |
Trace Impurities - Boron (B) | ≤6.200 ppb |
Trace Impurities - Cadmium (Cd) | ≤10.000 ppb |
Trace Impurities - Calcium (Ca) | ≤10.080 ppb |
Trace Impurities - Chromium (Cr) | ≤4.930 ppb |
Trace Impurities - Cobalt (Co) | ≤2.000 ppb |
Trace Impurities - Copper (Cu) | ≤1.680 ppb |
Trace Impurities - Gallium (Ga) | ≤20.000 ppb |
Trace Impurities - Germanium (Ge) | ≤10.000 ppb |
Trace Impurities - Gold (Au) | ≤10.000 ppb |
Heavy Metals (as Pb) | ≤500.0 ppb |
Trace Impurities - Iron (Fe) | ≤13.470 ppb |
Trace Impurities - Lead (Pb) | ≤2.430 ppb |
Trace Impurities - Lithium (Li) | ≤1.920 ppb |
Trace Impurities - Magnesium (Mg) | ≤5.230 ppb |
Trace Impurities - Manganese (Mn) | ≤1.560 ppb |
Trace Impurities - Molybdenum (Mo) | ≤10.000 ppb |
Trace Impurities - Nickel (Ni) | ≤3.260 ppb |
Trace Impurities - Niobium (Nb) | ≤10.000 ppb |
Trace Impurities - Potassium (K) | ≤850.000 ppb |
Trace Impurities - Silicon (Si) | ≤100.000 ppb |
Trace Impurities - Silver (Ag) | ≤10.000 ppb |
Trace Impurities - Sodium (Na) | ≤39.700 ppb |
Trace Impurities - Strontium (Sr) | ≤10.000 ppb |
Trace Impurities - Tantalum (Ta) | ≤10.000 ppb |
Color (APHA) | ≤10 |
Particle count at point of fill - 0.1 µm and higher (RION KS42A) | ≤23129.3 par/ml |
Particle count at point of fill - 0.2 µm and higher (RION KS42A) | ≤1596.8 par/ml |
Particle count at point of fill - 0.5 µm and higher (RION KS42A) | ≤350.0 par/ml |
Learn more
About VWR
Avantor is a vertically integrated, global supplier of discovery-to-delivery solutions for...